HORIBA’s plasma emission control product provides excellent plasma control over reactive sputtering (PVD).

The superb feedback control of the reactive gas flow in a reactive sputtering process helps enhance product quality and achieve greater productivity. This is achieved by monitoring the plasma generated by sputtering or the voltage of the power supply for the sputtering process. 

Achieve faster deposition by controlling the transition region and optimized distribution with our Plasma Emission Control product.